The Holographic Metasurface Nano-Lithography (HMNL) process developed by my lab uses sub-wavelength-patterned metasurface masks (metamasks) to create multi-colored holograms in photocurable metal-polymer hybrid resins. This process allows entire 3D, multi-material (insulators and conductors) nanostructures to be patterned using a single light exposure. Metasurfaces can be encoded with much higher information density than traditional spatial light modulators such as digital micromirror devices, so the use of metasurface optics in HMNL overcomes many of the low-resolution and small-patterning-area challenges presented by conventional holographic 3D printing approaches. Additionally, the size of the hologram produced is limited only by the size of the fabricated metasurface. Using this method, we have demonstrated the ability to fabricate structures with ~500 nm resolution over areas greater than 30 mm × 30 mm. We have also demonstrated that metasurface optics can be designed to produce different holographic patterns when exposed to different colors of light and have developed a new resin chemistry that produces conductive metal structures when exposed to UV light and dielectric polymer insulators when exposed to visible light. By combining these two advances, we can build 3D metal-insulator composite structures at a rate of over 20 mm3/s.